Browsing by imec author "1a00bb760e20c5ca0608491087a61c9d19f6d8e8"
Now showing items 41-60 of 106
-
High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout
Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010) -
imec's iN5 BEOL patterning development
Li, Waikin; Mao, Ming; Trivkovic, Darko; Murdoch, Gayle; Halder, Sandip; Ercken, Monique (2017) -
Immersion lithography and double patterning in advanced microelectronics
Vandeweyer, Tom; Bekaert, Joost; Ercken, Monique; Gronheid, Roel; Miller, Andy; Truffert, Vincent; Verhaegen, Staf; Versluijs, Janko; Wiaux, Vincent; Wong, Patrick; Vandenberghe, Geert; Maenhoudt, Mireille (2010) -
Immersion photoresist qualification
Ercken, Monique; Gronheid, Roel; Pollentier, Ivan; Leray, Philippe (2007-05) -
Impact of LER and CDU on device performance
Leunissen, Peter; Lorusso, Gian; Ercken, Monique; Croon, Jeroen; Jurczak, Gosia; Zhang, Wenqi; Wu, W.; Yang, H.; Azordegan, A.; DiBiase, T. (2005) -
Impact of water and top-coats on lithographic performance in 193nm immersion lithography
Kishimura, Shinji; Gronheid, Roel; Ercken, Monique; Maenhoudt, Mireille; Matsuo, Takahiro; Endo, Masayuki; Sasago, Masaru (2005) -
Inflection points in interconnect research and trends for 2nm and beyond in order to solve the RC bottleneck
Tokei, Zsolt; Vega Gonzalez, Victor; Murdoch, Gayle; O'Toole, Martin; Croes, Kristof; Baert, Rogier; van der Veen, Marleen; Adelmann, Christoph; Soulie, Jean-Philippe; Boemmels, Juergen; Wilson, Chris; Park, Seongho; Sankaran, Kiroubanand; Pourtois, Geoffrey; Swerts, Johan; Paolillo, Sara; Decoster, Stefan; Mao, Ming; Lazzarino, Frederic; Versluijs, Janko; Blanco, Victor; Ercken, Monique; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank; Heylen, Nancy; Teugels, Lieve; Devriendt, Katia; Struyf, Herbert; Morin, Pierre; Jourdan, Nicolas; Van Elshocht, Sven; Ciofi, Ivan; Gupta, Anshul; Zahedmanesh, Houman; Vanstreels, Kris; Na, Myung Hee (2020) -
Integration challenges for multi-gate devices
Collaert, Nadine; Brus, Stephan; De Keersgieter, An; Dixit, Abhisek; Ferain, Isabelle; Goodwin, Michael; Kottantharayil, Anil; Rooyackers, Rita; Verheyen, Peter; Yim, Yong Sik; Zimmerman, Paul; Beckx, Stephan; Degroote, Bart; Demand, Marc; Kim, Myeong-Cheol; Kunnen, Eddy; Locorotondo, Sabrina; Mannaert, Geert; Neuilly, Francois; Shamiryan, Denis; Baerts, Christina; Ercken, Monique; Laidler, David; Leys, Frederik; Loo, Roger; Lisoni, Judit; Snow, Jim; Vos, Rita; Boullart, Werner; Pollentier, Ivan; De Gendt, Stefan; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2005) -
Integration challenges of spin torque majority gatelogic
Wilson, Chris; Manfrini, Mauricio; Thiam, Arame; Souriau, Laurent; Babaei Gavan, Khashayar; Rassoul, Nouredine; Radisic, Dunja; Vaysset, Adrien; Trivkovic, Darko; Ercken, Monique; Swerts, Johan; Briggs, Basoene; Sayan, Safak; Radu, Iuliana; Mocuta, Dan (2016) -
Integration of a k=2.3 spin-on polymer for the sub-28nm technology node
Wilson, Chris; Lazzarino, Frederic; Truffert, Vincent; Kirimura, Tomoyuki; de Marneffe, Jean-Francois; Verdonck, Patrick; Hirai, M.; Nakatani, K.; Tada, M.; Heylen, Nancy; El-Mekki, Zaid; Vanstreels, Kris; Van Besien, Els; Ciofi, Ivan; Stucchi, Michele; Croes, Kristof; Zhang, Liping; Demuynck, Steven; Ercken, Monique; Xu, Kaidong; Baklanov, Mikhaïl; Tokei, Zsolt (2012) -
Integration of interconnected magnetic tunnel junctions for spin torque majority gates
Wan, Danny; Manfrini, Mauricio; Souriau, Laurent; Sayan, Safak; Jussot, Julien; Swerts, Johan; Rassoul, Nouredine; Babaei Gavan, Khashayar; Wouters, Lennaert; Paredis, Kristof; Huyghebaert, Cedric; Vaysset, Adrien; Thiam, Arame; Ercken, Monique; Wilson, Chris; Mocuta, Dan; Radu, Iuliana (2017) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Interim investigation of CD-SEM resist shrinkage in 193nm lithography
Hoffmann, Thomas; Storms, Greet; Vandenbroeck, Nadia; Delvaux, Christie; Ercken, Monique; Pollentier, Ivan; Ronse, Kurt; Takuji, Tada; Felten, Frank; Wong, Evelyn (2002) -
Junctionless array with ultrathin poly\TiN floating gate and HfAlO based intergate dielectric for sub-15nm planar NAND Flash
Blomme, Pieter; Versluijs, Janko; Ercken, Monique; Souriau, Laurent; Hody, Hubert; Vecchio, Emma; Paraschiv, Vasile; Tan, Chi Lim; Van den Bosch, Geert; Van Houdt, Jan (2016-05) -
Junctionless gate-all-around lateral and vertical nanowire FETs with simplified processing for advanced logic and analog/RF applications and scaled SRAM cells
Veloso, Anabela; Parvais, Bertrand; Matagne, Philippe; Simoen, Eddy; Huynh Bao, Trong; Paraschiv, Vasile; Vecchio, Emma; Devriendt, Katia; Rosseel, Erik; Ercken, Monique; Chan, BT; Delvaux, Christie; Altamirano Sanchez, Efrain; Versluijs, Janko; Tao, Zheng; Suhard, Samuel; Brus, Stephan; Sibaja-Hernandez, Arturo; Waldron, Niamh; Lagrain, Pieter; Richard, Olivier; Bender, Hugo; Vaisman Chasin, Adrian; Kaczer, Ben; Ivanov, Tsvetan; Ramesh, Siva; De Meyer, Kristin; Ryckaert, Julien; Collaert, Nadine; Thean, Aaron (2016) -
LCDU optimization of STT-MRAM 50nm pitch MTJ pillars for process window improvement
Pak, Murat; Crotti, Davide; Yasin, Farrukh; Ercken, Monique; Halder, Sandip; De Simone, Danilo; Vanelderen, Pieter; Souriau, Laurent; Hody, Hubert; Kar, Gouri Sankar (2019) -
Line edge roughness and its increasing importance
Ercken, Monique; Storms, Greet; Delvaux, Christie; Vandenbroeck, Nadia; Leunissen, Peter; Pollentier, Ivan (2002) -
Line edge roughness: characterization, modeling and impact on device behavior
Croon, Jeroen; Storms, Greet; Winkelmeier, Stephanie; Pollentier, Ivan; Ercken, Monique; Decoutere, Stefaan; Sansen, Willy; Maes, Herman (2002) -
Line edge roughness: experimental results related to a two-parameter model
Leunissen, Peter; Lawrence, W.G.; Ercken, Monique (2004) -
Line edge roughness: experimental results related to a two-parameter model
Leunissen, Peter; Lawrence, W.G.; Ercken, Monique (2003)