Browsing by author "Nicolosi, T."
Now showing items 1-5 of 5
-
A theoretical and experimental study of damage-free BEOL cleaning with megasonic agitation
Lauerhaas, Jeff; Wu, Y.; Bran, M.; Fraser, B.; Brause, E.; Nicolosi, T. (2003) -
Megasonic, non-contact cleaning followed by "Rotagoni" drying of CMP wafers
Lauerhaas, Jeff; Mertens, Paul; Nicolosi, T.; Kenis, Karine; Fyen, Wim; Heyns, Marc (2001) -
Single wafer cleaning and drying: particle removal via a non-contact, non-damaging megasonic clean followed by a high performance "Rotagoni" dry
Lauerhaas, Jeff; Mertens, Paul; Fyen, Wim; Kenis, Karine; Meuris, Marc; Nicolosi, T.; Bran, M.; Fraser, B.; Franklin, C.; Wu, Y.; Heyns, Marc (2000) -
Sub 100nm particle removal with deionized water and a megasonic frequency of 835kHz
Lauerhaas, Jeff; Wu, Y.; Xu, Kaidong; Vereecke, Guy; Vos, Rita; Kenis, Karine; Mertens, Paul; Nicolosi, T.; Heyns, Marc (2002) -
Sub 100nm particle removal with deionized water and a megasonic frequency of ~835kHz
Lauerhaas, Jeff; Xu, Kaidong; Vereecke, Guy; Vos, Rita; Kenis, Karine; Mertens, Paul; Wu, Y.; Nicolosi, T.; Heyns, Marc (2001)