Browsing by author "Vos, Rita"
Now showing items 1-20 of 194
-
50 nm Gate Length FinFET Biosensor & the Outlook for Single-Molecule Detection
Santermans, Sybren; Barge, David; Hellings, Geert; Bergfeld Mori, Carlos; Migacz, Konrad Joseph; Rip, Jens; Spampinato, Valentina; Vos, Rita; Du Bois, Bert; Ray Chaudhuri, Ashesh; Martino, J. A.; Heyns, Marc; Severi, Simone; Van Roy, Wim; Martens, Koen (2020) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Mertens, Paul; Heyns, Marc (2004) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Fyen, Wim; Mertens, Paul; Heyns, Marc; Vinckier, Chris; Fransaer, Jan (2005) -
A high-performance drying method enabling clustered single wafer wet cleaning
Mertens, Paul; Doumen, Geert; Lauerhaas, Jeff; Kenis, Karine; Fyen, Wim; Meuris, Marc; Arnauts, Sophia; Devriendt, Katia; Vos, Rita; Heyns, Marc (2000) -
A low-cost integrated biosensing platform based on SiN nanophotonics for biomarker detection in urine
Martens, D.; Ramirez-Priego, P.; Murib, M. S.; Elamin, A. A.; Gonzalez-Guerrero, A. B.; Stehr, M.; Jonas, F.; Anton, B.; Hlawatsch, N.; Soetaert, P.; Vos, Rita; Stassen, Andim; Severi, Simone; Van Roy, Wim; Bockstaele, R.; Becker, H.; Singh, M.; Lechuga, L. M.; Bienstman, Peter (2018) -
A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip
Vos, Rita; Rotondaro, Antonio; Mertens, Paul; Meuris, Marc; Heyns, Marc (1997) -
A novel resist and post-etch residue removal process using ozonated chemistries
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999) -
A point-of-care integrated photonic biosensor
Martens, Daan; Singh, M.; Elamin, A. A.; Jonas, F.; Gonzalez-Guerrero, A. B.; Lechuga, L. M.; Van Roy, Wim; Vos, Rita; Stassen, Andim; Severi, Simone; Bockstaele, R.; Becker, H.; Bienstman, Peter (2016) -
A polymeric acid sensor capable of measuring the severity of heartburn
Tack, J.; Vantrappen, G.; Huyberechts, Guido; Vos, Rita; Janssens, Johan; Van Overstraeten, Roger (1998) -
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007-09) -
Achieving low-VT Ni-FUSI CMOS via Lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2008) -
Acoustic cleaning in nano-electronics
Mertens, Paul; Janssens, Tom; Holsteyns, Frank; Zijlstra, Aaldert; Halder, Sandip; Wostyn, Kurt; Andreas, Michael; Hoyer, Ronald; Barbagini, Francesca; Wada, Masayuki; Franklin, Cole; Kim, Tae-Gon; Kim, K; Kenis, Karine; Le, Quoc Toan; Claes, Martine; Kesters, Els; Vos, Rita; Vereecke, Guy; Bearda, Twan; Heyns, Marc (2008) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced cleaning for the growth of ultrathin gate oxide
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999) -
Advanced cleaning strategies for ultra-clean silicon surfaces
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004)