Browsing by author "Mertens, Paul"
Now showing items 1-20 of 475
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A controlled deposition of organic contamination and the removal with ozone based cleaning
Claes, Martine; De Gendt, Stefan; Kenens, Conny; Conard, Thierry; Bender, Hugo; Storm, Wolfgang; Bauer, T.; Lagrange, Sébastien; Mertens, Paul; Heyns, Marc (2001) -
A detailed study of semiconductor wafer drying
Fyen, Wim; Holsteyns, Frank; Bearda, Twan; Arnauts, Sophia; Van Steenbergen, Jan; Doumen, Geert; Kenis, Karine; Mertens, Paul (2004) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Fyen, Wim; Mertens, Paul; Heyns, Marc; Vinckier, Chris; Fransaer, Jan (2005) -
A force study in brush scrubbing
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Doumen, Geert; Mertens, Paul; Heyns, Marc (2004) -
A high-performance drying method enabling clustered single wafer wet cleaning
Mertens, Paul; Doumen, Geert; Lauerhaas, Jeff; Kenis, Karine; Fyen, Wim; Meuris, Marc; Arnauts, Sophia; Devriendt, Katia; Vos, Rita; Heyns, Marc (2000) -
A less critical cleaning procedure for silicon wafer using diluted HF dip and boiling in isopryl alcohol as final steps
Gomes dos Santos Filho, S.; Hasenack, Claus; Salay, L. C.; Mertens, Paul (1995) -
A new cleaning concept for particle and metal removal on Si surfaces
Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Heyns, Marc (1994) -
A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip
Vos, Rita; Rotondaro, Antonio; Mertens, Paul; Meuris, Marc; Heyns, Marc (1997) -
A novel resist and post-etch residue removal process using ozonated chemistries
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999) -
A perspective on dry laser cleaning for semiconductor manufacturing
Vereecke, Guy; Röhr, Erika; Van Hoeymissen, Jan; Mertens, Paul; Heyns, Marc (2001) -
A study in interactions of plasmas and wet cleans with ULK materials
Xu, Kaidong; Vereecke, Guy; Kesters, Els; Le, Quoc Toan; Lux, Marcel; Kraus, Harald; Henry, Sally - Ann; Archer, L.; Gaulhofer, E.; Kovacs, F.; Dalmer, M.; Mertens, Paul; Luo, S. J; Han, Q. Y (2007) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, I; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2004) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, Ivo; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2005) -
Acoustic cleaning in nano-electronics
Mertens, Paul; Janssens, Tom; Holsteyns, Frank; Zijlstra, Aaldert; Halder, Sandip; Wostyn, Kurt; Andreas, Michael; Hoyer, Ronald; Barbagini, Francesca; Wada, Masayuki; Franklin, Cole; Kim, Tae-Gon; Kim, K; Kenis, Karine; Le, Quoc Toan; Claes, Martine; Kesters, Els; Vos, Rita; Vereecke, Guy; Bearda, Twan; Heyns, Marc (2008) -
Adsorption of metal ions onto hydrophilic silicon surfaces from aqueous solution: effect of pH
Loewenstein, Lee; Mertens, Paul (1998) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
Advanced cleaning for the growth of ultrathin gate oxide
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Cornelissen, Ingrid; De Gendt, Stefan; Kenis, Karine; Teerlinck, Ivo; Vos, Rita; Meuris, Marc; Heyns, Marc (1999) -
Advanced cleaning strategies for ultra-clean silicon surfaces
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, Sofie; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999)