Browsing by author "Okoroanyanwu, U."
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Lithographic process studies of 193 nm photoresists from six major commercial suppliers
Okoroanyanwu, U.; Levinson, H.; Goethals, Mieke; Van Roey, Frieda (1998) -
Progress in 193 nm photoresists and related process technologies
Okoroanyanwu, U.; Levinson, H.; Goethals, Mieke; Van Roey, Frieda (1998)