Browsing by author "Nafus, Kathleen"
Now showing items 41-60 of 70
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Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces
Rincon Delgadillo, Paulina; Gronheid, Roel; Lin, Guanyang; Cao, Yi; Romo, Ainhoa; Somervell, Mark; Nafus, Kathleen; Nealey, Paul (2014) -
Latest cluster performance for EUV lithography
Shite, Hideo; Matsunaga, Koichi; Nafus, Kathleen; Kosugi, H.; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Van Den Heuvel, Dieter (2012) -
LWR reduction by novel lithographic and etch techniques
Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi (2010) -
Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke; Shimura, Satoru (2014) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Novel metal containing resists for EUV lithography extendibility
De Simone, Danilo; Sayan, Safak; Dei, Satoshi; Pollentier, Ivan; Kuwahara, Yuhei; Vandenberghe, Geert; Nafus, Kathleen; Shiratani, Motohiro; Nakagawa, Hisashi; Naruoka, Takehiko (2016) -
Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe (2019) -
Origin of defect in directed self-assembly of block copolymers using feature multiplication
Rincon Delgadillo, Paulina; Harukawa, Ryoto; Parnell, Doni; Lee, Yu-tsung; Chan, BT; Lin, Guanyang; Cao, Yi; Nagaswami, Venkat; Somervell, Mark; Nafus, Kathleen; Gronheid, Roel; Nealey, Paul (2013) -
Partial wetting of aqueous solutions on high aspect ratio nanopillars with hydrophilic surface finish
Vereecke, Guy; Xu, XiuMei; Tsai, W.K.; Yang, Hui; Armini, Silvia; Delande, Tinne; Doumen, Geert; Kentie, F.; Shi, Xiaoping; Simms, Ihsan; Nafus, Kathleen; Holsteyns, Frank; Struyf, Herbert; De Gendt, Stefan (2014) -
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017) -
Process evaluation and optimization for EUV manufacturing
Foubert, Philippe; Nafus, Kathleen; Shite, Hideo; Goethals, Mieke; Matsunaga, Koichi; Hermans, Jan; Hendrickx, Eric (2012) -
Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration
Rincon Delgadillo, Paulina; Gronheid, Roel; Lin, Guanyan; Cao, Yi; Romo Negreira, Ainhoa; Somervell, Mark; Nafus, Kathleen; Nealey, Paul (2013) -
Progress in directed self-assembly hole shrink applications
Younkin, Todd; Gronheid, Roel; Rincon Delgadillo, Paulina; Chan, BT; Vandenbroeck, Nadia; Demuynck, Steven; Romo Negreira, Ainhoa; Parnell, Doni; Nafus, Kathleen; Tahara, Shigeru; Somervell, Mark (2013) -
Pupil optimization for after etch defectivity: what imaging metrics matter?
Frommhold, Andreas; Franke, Joern-Holger; Maslow, Mark J.; Nafus, Kathleen; Rispens, Gijsbert (2021) -
Recent advances in EUV patterning in preparation towards high-NA EUV
Nagahara, Seiji; Dauendorffer, Arnaud; Thiam, Arame; Liu, Xiang; Kuwahara, Yuhei; Dinh, Cong Que; Okada, Soichiro; Kawakami, Shinichiro; Genjima, Hisashi; Nagamine, Noriaki; Muramatsu, Makoto; Shimura, Satoru; Tsuboi, Atsushi; Nafus, Kathleen; Feurprier, Yannick; Demand, Marc; Ramaneti, Rajesh; Foubert, Philippe; De Simone, Danilo; Vandenberghe, Geert (2023) -
Rectification of EUV-patterned contact holes using directed self-assembly
Gronheid, Roel; Singh, Arjun; Younkin, Todd; Rincon Delgadillo, Paulina; Nealey, Paul; Chan, BT; Nafus, Kathleen; Romo Negreira, Ainhoa; Somervell, Mark (2013) -
Resist coating and developing process technology toward EUV manufacturing sub 7nm node
Kamei, Yuya; Shiozawa, Takahiro; Kawakami, Shinichiro; Shite, Hideo; Ichinomiya, Hiroshi; Hashimoto, Yusaku; Enomoto, Masashi; Nafus, Kathleen; Sonoda, Akihiko; Demand, Marc; Foubert, Philippe (2018) -
Resist fundamentals for resolution, LER and sensitivity (RLS) performance tradeoffs and their relation to micro-bridging defects
Rathsack, Benjamin; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011) -
Study of DSA interaction range using Gaussian convolution
Yi, Linda; Bekaert, Joost; Gronheid, Roel; Fenger, Germain; Nafus, Kathleen; Wong, H.-S. (2015)