Browsing by imec author "e632831b6ad7576998b3cf24720d40acca7a111e"
Now showing items 41-60 of 68
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III-V CMP process development
Ong, Patrick; Ansar, Sheikh; Gillot, Christophe; Lan, Yongqing; Teugels, Lieve; Waldron, Niamh; Proelss, Julian (2013) -
III/V CMP process development
Ong, Patrick; Usman Ibrahim, Ansar; Gillot, Christophe; Lan, Yongqing; Teugels, Lieve; Waldron, Niamh; Proelss, Julian (2013) -
Impact of ceria properties and CMP parameters on STI CMP performance
De Messemaeker, Jo; Put, Stijn; Nelis, Daniel; Van den bosch, Jeroen; Strauven, Yvan; Lippens, Paul; Sinapi, Fabrice; Ong, Patrick; Devriendt, Katia (2007) -
Impact of ceria properties and CMP parameters on STI CMP performance
De Messemaeker, Jo; Sinapi, Fabrice; Ong, Patrick; Put, Stijn; Nelis, Daniel; Van den bosch, Jeroen; Strauven, Yvan; Lippens, Paul; Devriendt, Katia (2007) -
Improving defectivity for III-V CMP processes for < 10 NM technology nodes
Teugels, Lieve; Ong, Patrick; Waldron, Niamh; Boccardi, Guillaume; Usman Ibrahim, Ansar; Siebert, Max; Leunissen, Leonardus (2014) -
Improving defectivity for III-V CMP processes for <10 nm technology nodes
Teugels, Lieve; Ong, Patrick; Boccardi, Guillaume; Waldron, Niamh; Usman Ibrahim, Ansar; Siebert, Joerg Max; Leunissen, Leonardus A.H. (2014) -
In depth analysis of 3D NAND enablers in gate stack integration and demonstration in 3D devices
Tan, Chi Lim; Lavizzari, Simone; Blomme, Pieter; Breuil, Laurent; Vecchio, Emma; Sebaai, Farid; Paraschiv, Vasile; Tao, Zheng; Schepers, Bart; Nyns, Laura; Peter, Antony; Dekkers, Harold; Ong, Patrick; Tsvetanova, Diana; Devriendt, Katia; Teugels, Lieve; Heylen, Nancy; Raymaekers, Tom; Jossart, Nico; Mennella, Pasquale; Delhougne, Romain; Vadakupudhu Palayam, Senthil; Arreghini, Antonio; Van den Bosch, Geert; Furnemont, Arnaud (2017) -
Influence of STI trench fill and dummy design on CMP behavior
Ong, Patrick; Devriendt, Katia; Redolfi, Augusto; Okuno, Yasutoshi; Hernandez, Jose Luis (2007) -
InGaAs gate-all-around nanowire devices on 300mm substrates
Waldron, Niamh; Merckling, Clement; Teugels, Lieve; Ong, Patrick; Ibrahim, Ansar; Sebaai, Farid; Pourghaderi, Mohammad Ali; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2014) -
Inspection, characterization and classification of defects for improved CMP of III-V materials
Bhonsle, Rithu; Teugels, Lieve; Usman Ibrahim, Ansar; Ong, Patrick; Delande, Tinne; Krishnan, S; Siebert, Max; Struyf, Herbert; Leunissen, Leonardus (2015) -
Inspection, characterization and classification of defects for improved CMP of III-V materials
Bhonsle, Rithu; Teugels, Lieve; Usman Ibrahim, Ansar; Ong, Patrick; Delande, Tinne; Krishnan, Sitaraman; Siebert, Max; Struyf, Herbert; Leunissen, Leonardus (2015) -
Integration of III-V on Si for high-mobility CMOS
Waldron, Niamh; Wang, G.; Nguyen, Ngoc Duy; Orzali, Tommaso; Merckling, Clement; Brammertz, Guy; Ong, Patrick; Winderickx, Gillis; Hellings, Geert; Eneman, Geert; Caymax, Matty; Meuris, Marc; Horiguchi, Naoto; Thean, Aaron (2012) -
Integration of InGaAs channel n-MOS devices on 200mm Si wafers using the aspect-ratio-trapping technique
Waldron, Niamh; Wang, Gang; Nguyen, Ngoc Duy; Orzali, Tommaso; Merckling, Clement; Brammertz, Guy; Ong, Patrick; Winderickx, Gillis; Hellings, Geert; Eneman, Geert; Caymax, Matty; Meuris, Marc; Horiguchi, Naoto; Thean, Aaron (2012) -
O-band GeSi quantum-confined Stark effect electro-absorption modulator integrated in a 220nm silicon photonics platform
Porret, Clément; Srinivasan, Ashwyn; Balakrishnan, Sadhishkumar; Verheyen, Peter; Favia, Paola; Bender, Hugo; Ong, Patrick; Loo, Roger; Van Campenhout, Joris; Pantouvaki, Marianna (2020) -
Optimized post-CMP and pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens (2012) -
Optimized post-CMP and Pre-Epi cleans to enable smooth and high quality epitaxial strained Ge growth on SiGe strain relaxed buffers
Loo, Roger; Souriau, Laurent; Ong, Patrick; Kenis, Karine; Rip, Jens (2010-09) -
Overview of FRONT-END CMP processes for 28nm and beyond
Ong, Patrick; Devriendt, Katia (2012) -
Oxide CMP steps in the integration of vertical Si nanowire tunnelFET devices
Devriendt, Katia; Ong, Patrick; Lee, Willie; Rooyackers, Rita; Vandooren, Anne; De Gendt, Stefan; Leunissen, Peter (2010) -
Replacement fin processing for III-V on Si: From FinFets to nanowires
Waldron, Niamh; Merckling, Clement; Teugels, Lieve; Ong, Patrick; Sebaai, Farid; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2016) -
RMG Technology Integration in FinFET Devices
Boccardi, Guillaume; Ritzenthaler, Romain; Togo, Mitsuhiro; Chiarella, Thomas; Kim, Min-Soo; Sasaki, Yuichiro; Veloso, Anabela; Chew, Soon Aik; Vecchio, Emma; Locorotondo, Sabrina; Devriendt, Katia; Ong, Patrick; Brus, Stephan; Horiguchi, Naoto; Thean, Aaron (2012)