Browsing by author "Heyns, Marc"
Now showing items 21-40 of 1135
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A MOS capacitor model for ultra-thin 2D semiconductors: the impact of interface defects and channel resistance
Gaur, Abhinav; Agarwal, Tarun; Asselberghs, Inge; Radu, Iuliana; Heyns, Marc; Lin, Dennis (2020) -
A new cleaning concept for particle and metal removal on Si surfaces
Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Heyns, Marc (1994) -
A new HF vapor native oxide removal process for cluster applications
Sprey, Hessel; Storm, Arjen; Maes, Jan; Granneman, E. H. A.; Hendriks, Marton; Röhr, Erika; Caymax, Matty; Decoutere, Stefaan; Heyns, Marc (1998) -
A new HF vapor process for native oxide removal, suited for cluster applications
Storm, Arjen; Sprey, Hessel; Maes, Jan; Granneman, E.; De Blank, Rene; Röhr, Erika; Caymax, Matty; Heyns, Marc (1999) -
A new method to calculate leakage current and its applications for sub-45nm MOSFETs
Lujan, Guilherme; Magnus, Wim; Soree, Bart; Pourghaderi, Mohammad Ali; Veloso, Anabela; Van Dal, Mark; Lauwers, Anne; Kubicek, Stefan; De Gendt, Stefan; Heyns, Marc; De Meyer, Kristin (2005) -
A novel approach for the elimination of the pattern density dependence of CMP for shallow trench isolation
Grillaert, Joost; Heylen, Nancy; Vrancken, Evi; Badenes, Gonçal; Rooyackers, Rita; Meuris, Marc; Heyns, Marc (1998) -
A novel environmentally-friendly corrosion-free post-stripping rinsing procedure after solvent strip
Vos, Rita; Rotondaro, Antonio; Mertens, Paul; Meuris, Marc; Heyns, Marc (1997) -
A novel resist and post-etch residue removal process using ozonated chemistries
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998) -
A novel resist and post-etch residue removal process using ozonated chemistry
De Gendt, Stefan; Snee, Peter; Cornelissen, Ingrid; Lux, Marcel; Vos, Rita; Mertens, Paul; Knotter, D. M.; Meuris, Marc; Heyns, Marc (1999) -
A perspective on dry laser cleaning for semiconductor manufacturing
Vereecke, Guy; Röhr, Erika; Van Hoeymissen, Jan; Mertens, Paul; Heyns, Marc (2001) -
A semi-quantitative method for studying photoresist stripping
Rotondaro, Antonio; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Vandervorst, Wilfried; Claeys, Cor; Hellemans, L.; Snauwert, L. (1994) -
A step towards a better understanding of silicon passivated (100) Ge p-channel
Pourtois, Geoffrey; Houssa, Michel; De Jaeger, Brice; Leys, Frederik; Kaczer, Ben; Martens, Koen; Caymax, Matty; Meuris, Marc; Groeseneken, Guido; Heyns, Marc (2007) -
A study of relaxation current in high-k gate stacks
Xu, Zhen; Pantisano, Luigi; Kerber, Andreas; Degraeve, Robin; Cartier, Eduard; De Gendt, Stefan; Heyns, Marc; Groeseneken, Guido (2004-03) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, I; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2004) -
A study of the influence of typical wet chemical treatments on the germanium wafer surface
Onsia, Bart; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Hoflijk, Ilse; Mertens, Paul; Meuris, Peter; Raskin, G.; Sioncke, Sonja; Teerlinck, Ivo; Theuwis, A.; Van Steenbergen, Jan; Vinckier, Chris (2005) -
A theoretical study of the initial oxidation of the GaAs(001)-beta2(2x4) surface
Scarrozza, Marco; Pourtois, Geoffrey; Houssa, Michel; Caymax, Matty; Stesmans, Andre; Meuris, Marc; Heyns, Marc (2009) -
A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level
De Smedt, Frank; Stevens, G.; De Gendt, Stefan; Cornelissen, Ingrid; Arnauts, Sophia; Meuris, Marc; Heyns, Marc; Vinckier, Chris (1999) -
Achievements and challenges for the electrical performance of MOSFETs with high-k gate dielectrics
Groeseneken, Guido; Pantisano, Luigi; Ragnarsson, Lars-Ake; Degraeve, Robin; Houssa, Michel; Kauerauf, Thomas; Roussel, Philippe; De Gendt, Stefan; Heyns, Marc (2004) -
Acoustic cleaning in nano-electronics
Mertens, Paul; Janssens, Tom; Holsteyns, Frank; Zijlstra, Aaldert; Halder, Sandip; Wostyn, Kurt; Andreas, Michael; Hoyer, Ronald; Barbagini, Francesca; Wada, Masayuki; Franklin, Cole; Kim, Tae-Gon; Kim, K; Kenis, Karine; Le, Quoc Toan; Claes, Martine; Kesters, Els; Vos, Rita; Vereecke, Guy; Bearda, Twan; Heyns, Marc (2008)