Browsing by author "Mertens, Paul"
Now showing items 21-40 of 475
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Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001) -
Advanced single chemistry alkaline cleaning in a STEAG single tank tool
Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Advanced wet and dry cleaning coming together for next generation
Heyns, Marc; Mertens, Paul; Ruzyllo, Jerzy; Leeman, Marc (1999) -
Advances in understanding wet cleaning technology and the effect of metal contamination
Heyns, Marc; Bearda, Twan; Cornelissen, Ingrid; De Gendt, Stefan; Loewenstein, Lee; Mertens, Paul; Mertens, S.; Meuris, Marc; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1999) -
Aging phenomena in the removal of nano-particles from Si wafers
Vereecke, Guy; Veltens, J.; Xu, Kaidong; Eitoku, A.; Sano, Ken-Ichi; Arnauts, Sophia; Kenis, Karine; Snow, J.; Vinckier, Chris; Mertens, Paul (2008) -
Alkaline cleaning of silicon wafers: additives for the prevention of metal contamination
Martin Hoyas, Ana; Baeyens, Martien; Hub, W.; Mertens, Paul; Kolbesen, B. O. (1999) -
All wet photoresist strip by solvent aerosol spray
Wada, Masayuki; Sano, Ken-Ichi; Snow, Jim; Vos, Rita; Leunissen, Peter; Mertens, Paul; Eitoku, A (2008) -
All wet strip approaches for post-etch photoresist layers after low-k patterning
Claes, Martine; Le, Quoc Toan; Kesters, Els; Lux, Marcel; Urionabarrenetxea, Ainara; Vereecke, Guy; Mertens, Paul; Carleer, R.; Adriaensens, P. (2007) -
An analytical model to describe the efficiency of an immersion rinsing process
Fyen, Wim; Mertens, Paul (2008-11) -
Analysis of the gate voltage fluctuations in ultra-thin gate oxides after soft breakdown
Houssa, Michel; Vandewalle, N.; Nigam, Tanya; Ausloos, M.; Mertens, Paul; Heyns, Marc (1998) -
Analyzing the collapse force determined using lateral force AFM using
Wostyn, Kurt; Kim, Tae-Gon; Park, Jin-Goo; Mertens, Paul (2008) -
Analyzing the collapse force determined using lateral force AFM using mechanics theory
Wostyn, Kurt; Kim, Tae-Gon; Park, Jin-Goo; Mertens, Paul (2008) -
Analyzing the collapse force of narrow lines measured by lateral force AFM using an analytical mechanical model
Wostyn, Kurt; Kim, Tae-Gon; Mertens, Paul; Park, Jin-Goo (2009) -
Application of single-wafer wet cleaning prior to epitaxial SiGe process
Sano, Ken-Ichi; Wada, Masayuki; Leys, Frederik; Loo, Roger; Hikavyy, Andriy; Mertens, Paul; Snow, Jim; Izumi, A.; Miya, Katsuhiko; Eitoku, Atsuro (2009) -
Behaviour of metallic contaminants during MOS processing
Bearda, Twan; De Gendt, Stefan; Loewenstein, Lee; Knotter, Martin; Mertens, Paul; Heyns, Marc (1998) -
Behaviour of metallic contaminants during MOS processing
Bearda, Twan; De Gendt, Stefan; Loewenstein, Lee; Knotter, Martin; Mertens, Paul; Heyns, Marc (1999) -
Breakdown and recovery of thin gate oxides
Bearda, Twan; Mertens, Paul; Heyns, Marc; Woerlee, P.; Wallinga, H. (2000) -
Breakdown and recovery of thin gate oxides
Bearda, Twan; Mertens, Paul; Heyns, Marc; Wallinga, H.; Woerlee, P. (2000) -
Bubble size distribution analysis and control in high frequency ultrasonic cleaning processes
Hauptmann, Marc; Struyf, Herbert; Mertens, Paul; Heyns, Marc; De Gendt, Stefan; Glorieux, Christ; Brems, Steven (2012)