Browsing by author "Schmidt, Harald"
Now showing items 21-31 of 31
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Physico chemical aspects of hydrogen peroxide based silicon wafer cleaning solutions
Schmidt, Harald; Meuris, Marc; Mertens, Paul; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1994) -
Real-time monitoring of wet chemial oxidation and etching processes on semiconductor surfaces for process optimization and waste minimization
Schmidt, Harald; Teerlinck, Ivo; Biesemans, Serge; Heyns, Marc (1996) -
Sensitive light scattering as a semiquantitative method for studying photoresist stripping
Rotondaro, Antonio; Meuris, Marc; Schmidt, Harald; Heyns, Marc; Claeys, C.; Hellemans, L.; Snauwaert, L. (1995) -
Silicon surface roughening by the decomposition of hydrogen peroxide
Schmidt, Harald; Meuris, Marc; Mertens, Paul; Verhaverbeke, Steven; Heyns, Marc; Hellemans, L.; Snauwaert, J.; Dillenbeck, C. (1994) -
The IMEC clean : A new concept for particle and metal removal on Si surfaces
Meuris, Marc; Mertens, Paul; Opdebeeck, Ann; Schmidt, Harald; Depas, Michel; Vereecke, Guy; Heyns, Marc; Philipossian, A. (1995) -
The IMEC Clean concept : an advanced wafer cleaning technology
Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Heyns, Marc; Depas, Michel; Philipossian, A.; Vatel, Oliver (1994) -
The importance of H2O2 decomposition in silicon surface cleaning
Schmidt, Harald; Meuris, Marc; Mertens, Paul; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1994) -
The role of hydrogen peroxide in the SC2 clean
Hurd, Trace; Mertens, Paul; Schmidt, Harald; Ditter, D.; Hall, L. H.; Meuris, Marc; Heyns, Marc (1994) -
Ultra clean processing technologies: advanced si-surface preparation techniques
Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Verhaverbeke, Steven; Hatcher, Z.; Gräf, D. (1994) -
Ultra Clean Processing Technologies: Advanced Si-Surface Preparation Techniques
Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Verhaverbeke, Steven; Hatcher, Z.; Gräf, D. (1994) -
Ultra clean processing technology for highly reliable gate oxides
Heyns, Marc; Meuris, Marc; Mertens, Paul; Schmidt, Harald; Verhaverbeke, Steven; Bender, Hugo; Vandervorst, Wilfried; Caymax, Matty; Rotondaro, Antonio; Hatcher, Z.; Gräf, D. (1994)