Browsing by author "Ronse, Kurt"
Now showing items 21-40 of 225
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Arf solutions for low-k1 back-end imaging
Wiaux, Vincent; Montgomery, Patrick; Vandenberghe, Geert; Monnoyer, Philippe; Ronse, Kurt; Conley,; Litt,; Lucas,; Finders, Jo; Socha,; Van Den Broeke, (2003) -
Assessing the challenges of EUV lithography
Ronse, Kurt (2007-02) -
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007) -
Assessment of OPC effectiveness using two-dimensional metrics
Wiaux, Vincent; Philipsen, Vicky; Jonckheere, Rik; Vandenberghe, Geert; Verhaegen, Staf; Hoffmann, Thomas; Ronse, Kurt; Howard, William B.; Maurer, Wilhelm; Preil, Moshe E. (2002) -
Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
AttPSM CD control: mask bias and flare effects
Kim, Young-Chang; Vandenberghe, Geert; Ronse, Kurt (2002) -
Automated OPC for application in advanced lithography
Ronse, Kurt; Tritchkov, Alexander; Randall, John; Jonckheere, Rik; Ghandehari, Kouros; Van den hove, Luc (1997) -
Bottom-ARC optimization methodology for 0.25μm lithography and beyond
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Feng, Hong Zhang; Delvaux, Christie; Richardson, Paul; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C.; van Wingerden, Johannes (1998) -
CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998) -
CD control for 180-nm and 130-nm gate-level lithography
Kim, Kee - Ho; Ronse, Kurt; Goethals, Mieke; Vandenberghe, Geert; Van den hove, Luc (1996) -
CD control for two-dimensional features in future technology nodes
Verhaegen, Staf; Gordon, R.; Jonckheere, Rik; McCallum, M.; Ronse, Kurt (2001) -
CD control using SiON BARL processing for sub 0.25µm lithography
Zhang, Fenghong; Op de Beeck, Maaike; Ronse, Kurt; Gangala, Hareen K; Gopalan, P.; Conley, P.; Dusa, M.; Bendik, Joe (1998) -
CD control using SiON BARL processing for sub-0.25μm lithography
Zhang, Fenghong; Op de Beeck, Maaike; Schaekers, Marc; Ronse, Kurt; Conley, W.; Gopalan, P.; Gangala, Hareen K; Dusa, M.; Bendik, Joe (1999) -
CD Control: The limiting factor for i-line and deep-UV lithography?
Ronse, Kurt; Pforr, Rainer; Op de Beeck, Maaike; Van den hove, Luc (1995) -
CD-control comparison for sub-0.18μm patterning using 248 nm lithography and strong resolution enhancement techniques
Vandenberghe, Geert; Marschner, Thomas; Ronse, Kurt; Socha, R.; Dusa, M. (1999) -
Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM
Kim, Young-Chang; Vandenberghe, Geert; Verhaegen, Staf; Ronse, Kurt (2002) -
Challenges and outlook of 193nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Challenges for 0.35-0.25 μm optical lithography
Van den hove, Luc; Ronse, Kurt (1995) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Characterization and optimization of CD control for 0.25µm CMOS applications
Ronse, Kurt; Op de Beeck, Maaike; Yen, Anthony; Kim, Kee - Ho; Van den hove, Luc (1996)