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High yield and process uniformity for 300 mm integrated WS2 FETs
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Authors
Schram, Tom
;
Smets, Quentin
;
Radisic, Dunja
;
Groven, Benjamin
;
Thiam, Arame
;
Li, Waikin
;
Dupuy, Emmanuel
;
Vandersmissen, Kevin
;
Maurice, Thibaut
;
Asselberghs, Inge
;
Radu, Iuliana
ISSN
NA
Conference
Symposium on VLSI Technology
Journal
NA
Research discipline
Electrical & electronic engineering
Title
High yield and process uniformity for 300 mm integrated WS2 FETs
Publication type
Meeting abstract
Embargo date
2021-06-13
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2
20.500.12860/38445.2
*
2022-09-22T09:04:04Z
validation by library/open access desk
1
20.500.12860/38445
2021-11-19T13:21:51Z
*Selected version
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