Browsing Conference contributions by author "Abell, Thomas"
Now showing items 1-11 of 11
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Atomic layer deposited barriers for copper interconnects
Schuhmacher, Jorg; Martin Hoyas, Ana; Ernur, Didem; Tokei, Zsolt; Travaly, Youssef; Bruynseraede, Christophe; Satta, Alessandra; Whelan, Caroline; Shamiryan, Denis; Beyer, Gerald; Abell, Thomas; Sutcliffe, Victor; Schaekers, Marc; Maex, Karen (2004) -
Atomic layer deposition of barriers for interconnect
Besling, Wim; Satta, Alessandra; Schuhmacher, Jörg; Abell, Thomas; Sutcliffe, Victor; Martin Hoyas, Ana; Beyer, Gerald; Gravesteijn, Dirk; Maex, Karen (2002) -
Buckling instabilities of thin cap layers deposited onto low-k dielectric films
Iacopi, Francesca; Brongersma, Sywert; Abell, Thomas; Maex, Karen (2003) -
Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material
Travaly, Youssef; Kemeling, N.; Maenhoudt, Mireille; Peeters, S.; Tokei, Zsolt; Abell, Thomas; Schuhmacher, Jörg; Turturro, S.; Vos, Ingrid; Eugene, Lino; Matsuki, N.; Fukazawa, A.; Goundar, K.; Satoh, K.; Kato, M.; Kaneko, S.; Vertommen, Johan; Sprey, Hessel; Van Hove, Marleen; Jonas, A.; Maex, Karen (2004) -
Comparison of modulus and density measurements by nanoidentation, SAWS, XRR and EP techniques of a porous low k MSQ dielectric
Abell, Thomas; Iacopi, Francesca; Prokopowicz, Greg; Sun, Brad; Mazurenko, Alex; Travaly, Youssef; Baklanov, Mikhaïl; Jonas, Alain; Sullivan, Chris; Brongersma, Sywert; Liou, Huey-Chiang; Tower, Josua; Gostein, Michael; Gallagher, Mike; Calvert, Jeff; Moinpour, Mansour; Maex, Karen (2005-01) -
Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics
Abell, Thomas; Shamiryan, Denis; Patz, Matthias; Maex, Karen (2004) -
Nucleation and growth dependence of ALD WNC on substrate surface condition
Abell, Thomas; Schuhmacher, Jörg; Travaly, Youssef; Maex, Karen (2004) -
Opportunities and challenges for integration of ALD barrier layers in damascene process flows
Sprey, Hessel; Schuhmacher, Jorg; Travaly, Youssef; Sutcliffe, Victor; Abell, Thomas; Bastings, Hans; Stokhof, Maarten; Haukka, Suvi; Li, Wei-Min; Beyer, Gerald; Raaijmakers, Ivo (2004) -
Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
Abell, Thomas; Shamiryan, Denis; Schuhmacher, Jörg; Besling, W.; Sutcliffe, V.; Maex, Karen (2003) -
Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low-k dielectric films
Abell, Thomas; Houthoofd, Kristof; Iacopi, Francesca; Grobet, Piet; Maex, Karen (2005) -
Surface acoustic waves as a technique for in-line detection of processing damage to low-k dielectrics
Iacopi, Francesca; Brongersma, Sywert; Mazurenko, Alexander; Struyf, Herbert; Mannaert, Geert; Travaly, Youssef; Maznev, Alexey; Abell, Thomas; Tower, Joshua; Maex, Karen (2005-06)