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dc.contributor.authorMacha, Michal
dc.contributor.authorMarion, Sanjin
dc.contributor.authorTripathi, Mukesh
dc.contributor.authorThakur, Mukeshchand
dc.contributor.authorLihter, Martina
dc.contributor.authorKis, Andras
dc.contributor.authorSmolyanitsky, Alex
dc.contributor.authorRadenovic, Aleksandra
dc.date.accessioned2023-04-27T13:49:20Z
dc.date.available2022-10-10T02:47:48Z
dc.date.available2023-04-27T13:49:20Z
dc.date.issued2022
dc.identifier.issn1936-0851
dc.identifier.otherWOS:000862394800001
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/40546.3
dc.sourceWOS
dc.titleHigh-Throughput Nanopore Fabrication and Classification Using Xe-Ion Irradiation and Automated Pore-Edge Analysis
dc.typeJournal article
dc.contributor.imecauthorMarion, Sanjin
dc.contributor.orcidimecMarion, Sanjin::0000-0002-9892-7378
dc.identifier.doi10.1021/acsnano.2c05201
dc.source.numberofpages11
dc.source.peerreviewyes
dc.source.beginpage16249
dc.source.endpage16259
dc.source.journalACS NANO
dc.identifier.pmidMEDLINE:36153997
dc.source.issue10
dc.source.volume16
imec.availabilityPublished - imec
dc.description.wosFundingTextThis work was in part financially supported by Swiss National Science Foundation (SNSF) support through 200021_192037 and the CCMX Materials Challenge grant ?Large area growth of 2D materials for device integration?. A.S. gratefully acknowledges support from the Materials Genome Initiative.


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