Damage minimized plasma pore sealing of microporous low k dielectrics
dc.contributor.author | Abell, Thomas | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-15T12:38:34Z | |
dc.date.available | 2021-10-15T12:38:34Z | |
dc.date.issued | 2004 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/8454 | |
dc.source | IIOimport | |
dc.title | Damage minimized plasma pore sealing of microporous low k dielectrics | |
dc.type | Journal article | |
dc.contributor.imecauthor | Maex, Karen | |
dc.source.peerreview | no | |
dc.source.beginpage | 16 | |
dc.source.endpage | 19 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1_4 | |
dc.source.volume | 76 | |
imec.availability | Published - imec | |
imec.internalnotes | Materials for Advanced Metallization; Brussels; March 2004 |
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