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Damage minimized plasma pore sealing of microporous low k dielectrics

dc.contributor.authorAbell, Thomas
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-15T12:38:34Z
dc.date.available2021-10-15T12:38:34Z
dc.date.issued2004
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/8454
dc.sourceIIOimport
dc.titleDamage minimized plasma pore sealing of microporous low k dielectrics
dc.typeJournal article
dc.contributor.imecauthorMaex, Karen
dc.source.peerreviewno
dc.source.beginpage16
dc.source.endpage19
dc.source.journalMicroelectronic Engineering
dc.source.issue1_4
dc.source.volume76
imec.availabilityPublished - imec
imec.internalnotesMaterials for Advanced Metallization; Brussels; March 2004


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