Kittl, JorgeJorgeKittlPawlak, MalgorzataMalgorzataPawlakTorregiani, CristinaCristinaTorregianiLauwers, AnneAnneLauwersDemeurisse, CarolineCarolineDemeurisseVrancken, ChristaChristaVranckenAbsil, PhilippePhilippeAbsilBiesemans, SergeSergeBiesemansCoia, CedrikCedrikCoiaDetavernier, ChristopheChristopheDetavernierJordan-Sweet, JeanJeanJordan-SweetLavoie, ChristianChristianLavoie2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12406Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully-silicided gate applicationsJournal article