Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials

Rathsack, BenBenRathsackScheer, StevenStevenScheerKuwahara, YuheiYuheiKuwaharaKitano, JunichiJunichiKitanoGronheid, RoelRoelGronheidBaerts, ChristinaChristinaBaerts2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14363Finite element modeling of PAG leaching and water uptake in immersion lithography resist materialsProceedings paper