Van Elshocht, SvenSvenVan ElshochtAdelmann, ChristophChristophAdelmannLehnen, PeerPeerLehnenDe Gendt, StefanStefanDe Gendt2021-10-182021-10-1820091099-0062https://imec-publications.be/handle/20.500.12860/16381Equivalent oxide thickness reduction for high-k gate stacks by optimized rare-earth silicate reactionsJournal articlehttp://www.ecsdl.org/getabs/servlet/GetabsServlet?prog=normal&id=ESLEF6000012000005000G17000001&idtype=cvips&gifs=Yes