Meeting double patterning challenges: from split to process control

Wiaux, VincentVincentWiauxCheng, ShauneeShauneeChengMaenhoudt, MireilleMireilleMaenhoudtStorms, GreetGreetStormsVandenberghe, GeertGeertVandenbergheVerhaegen, StafStafVerhaegen2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/13222Meeting double patterning challenges: from split to process controlOral presentation