A novel trapping/detrapping model for defect profiling in high-k materials using the two-pulse capacitance-voltage technique

Ruiz Aguado, DanielDanielRuiz AguadoGovoreanu, BogdanBogdanGovoreanuZhang, W.D.W.D.ZhangJurczak, GosiaGosiaJurczakDe Meyer, KristinKristinDe MeyerVan Houdt, JanJanVan Houdt2021-10-182021-10-1820100018-9383https://imec-publications.be/handle/20.500.12860/17916A novel trapping/detrapping model for defect profiling in high-k materials using the two-pulse capacitance-voltage techniqueJournal article