Kesters, ElsElsKestersLe, Quoc ToanQuoc ToanLeLux, MarcelMarcelLuxPrager, LutzLutzPragerVereecke, GuyGuyVereecke2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15590Modification of 193-nm photoresist by UV irradiation for post-etch wet strip applicationsMeeting abstract