The role of fluorine with Ge pre-amorphisation in forming PMOS junctions for the 65-nm CMOS technology node

Pawlak, BartekBartekPawlakLindsay, RichardRichardLindsaySurdeanu, RaduRaduSurdeanuPagès, XavierXavierPagèsVandervorst, WilfriedWilfriedVandervorstVan der Jeugd, KeesKeesVan der Jeugd2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7989The role of fluorine with Ge pre-amorphisation in forming PMOS junctions for the 65-nm CMOS technology nodeProceedings paper