Reliable sub-nanometer repeatability for CD metrology in a reticle production environment

Hourd, AndrewAndrewHourdGrimshaw, AnthonyAnthonyGrimshawScheuring, GerdGerdScheuringGittinger, ChristianChristianGittingerDöbereiner, StefanStefanDöbereinerHillmann, FrankFrankHillmannBrück, Hans-JürgenHans-JürgenBrückChen, Shiuh-BinShiuh-BinChenChen, ParksonParksonChenJonckheere, RikRikJonckheerePhilipsen, VickyVickyPhilipsenHartmann, HansHansHartmannOrdynskyy, VladimirVladimirOrdynskyyPeter, KaiKaiPeterSchätz, ThomasThomasSchätzSommer, KarlKarlSommer2021-10-142021-10-142002-12https://imec-publications.be/handle/20.500.12860/6408Reliable sub-nanometer repeatability for CD metrology in a reticle production environmentProceedings paper