Validation of CD-SEM etching residue evaluation technique for MuGFET structures

Isawa, MikiMikiIsawaTanaka, MakiMakiTanakaMaeda, TatsuyaTatsuyaMaedaWatanabe, KenjiKenjiWatanabeVandeweyer, TomTomVandeweyerCollaert, NadineNadineCollaertRooyackers, RitaRitaRooyackers2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15525Validation of CD-SEM etching residue evaluation technique for MuGFET structuresProceedings paper