Van Den Heuvel, DieterDieterVan Den HeuvelJonckheere, RikRikJonckheereMagana, JohnJohnMaganaAbe, TsukasaTsukasaAbeBret, TristanTristanBretHendrickx, EricEricHendrickxCheng, ShauneeShauneeChengRonse, KurtKurtRonse2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18160Natural EUV mask blank defects: evidence, timely detection, analysis and outlookProceedings paper