Relation between oxide-CMP induced defects and post-CMP cleaning strategies

Devriendt, KatiaKatiaDevriendtVrancken, EviEviVranckenHeylen, NancyNancyHeylenGrillaert, JoostJoostGrillaertMeuris, MarcMarcMeurisHeyns, MarcMarcHeynsLing, Zhi MingZhi MingLing2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2546Relation between oxide-CMP induced defects and post-CMP cleaning strategiesOral presentation