Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculations

Kim, Kee - HoKee - HoKimRonse, KurtKurtRonseYen, AnthonyAnthonyYenVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1293Feasability demonstration of 0.18 µm and 0.13 µm optical projection lithography based on CD control calculationsProceedings paper