French, Roger H.Roger H.FrenchTran, Hoang V.Hoang V.TranAdelman, Doug J.Doug J.AdelmanRogado, Nyrissa S.Nyrissa S.RogadoKaku, MureoMureoKakuMocella, MichaelMichaelMocellaChen, Charles Y.Charles Y.ChenHendrickx, EricEricHendrickxVan Roey, FriedaFriedaVan RoeyBernfeld, Adam S.Adam S.BernfeldDerryberry, Rebekah A.Rebekah A.Derryberry2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13739High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitchesProceedings paper