Extending EUV lithography for DRAM applications

Rispens, GijsbertGijsbertRispensVan Lare, C.C.Van LareOorschot, D.D.OorschotHoefnagels, R.R.HoefnagelsLiu, S.S.LiuVan Mierlo, W.W.Van MierloZuurbier, N.N.ZuurbierDardani, Z.Z.DardaniWang, Z.Z.WangMaslow, M.M.MaslowFinders, J.J.FindersFallica, RobertoRobertoFallicaFrommhold, AndreasAndreasFrommholdHendrickx, EricEricHendrickxNiroomand, A.A.NiroomandLight, S.S.Light2021-10-292021-10-292020https://imec-publications.be/handle/20.500.12860/35836Extending EUV lithography for DRAM applicationsProceedings paperhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/11323/113230U/Extending-EUV-lithography-for-DRAM-applications/10.1117/12.2552067.full?SSO=1