Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

Vanhellemont, JanJanVanhellemontMilita, S.S.MilitaServidori, M.M.ServidoriHiggs, V.V.HiggsKissinger, G.G.KissingerGramenova, EmiliaEmiliaGramenovaSimoen, EddyEddySimoenJansen, PhilippePhilippeJansen2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/2271Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yieldJournal article