Dry etch processing of Multiple Gate FETs with metal gate electrode

Demand, MarcMarcDemandParaschiv, VasileVasileParaschivShamiryan, DenisDenisShamiryanBeckx, StephanStephanBeckxBoullart, WernerWernerBoullartVanhaelemeersch, SergeSergeVanhaelemeersch2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10367Dry etch processing of Multiple Gate FETs with metal gate electrodeProceedings paper