Dry etch and clean aspects for advanced integration of low k dielectrics

Vanhaelemeersch, SergeSergeVanhaelemeerschStruyf, HerbertHerbertStruyfAlaerts, CarineCarineAlaertsBaklanov, MikhaïlMikhaïlBaklanovLepage, MurielMurielLepage2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4890Dry etch and clean aspects for advanced integration of low k dielectricsOral presentation