Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis

Watanabe, GentaGentaWatanabeJonckheere, RikRikJonckheereVerduijn, ErikErikVerduijnFukugami, NorihitoNorihitoFukugamiSakata, YoYoSakataKodera, YutakaYutakaKoderaGallagher, EmilyEmilyGallagher2021-10-232021-10-232015https://imec-publications.be/handle/20.500.12860/26166Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysisOral presentation