Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applications

Kesters, ElsElsKestersLux, MarcelMarcelLuxPittevils, JorisJorisPittevilsBaeyens, JonasJonasBaeyensVereecke, GuyGuyVereeckeStruyf, HerbertHerbertStruyf2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17361Influence of photoresist and BARC selection on the efficiency of a post-etch wet strip in BEOL applicationsMeeting abstract