Fallica, RobertoRobertoFallicaMahne, NicolaNicolaMahneConard, ThierryThierryConardVanleenhove, AnjaAnjaVanleenhovede Simone, DaniloDanilode SimoneNannarone, StefanoStefanoNannarone2024-01-232024-01-2320231944-8244WOS:001029687700001https://imec-publications.be/handle/20.500.12860/43443Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eVJournal article10.1021/acsami.3c05884WOS:001029687700001SECONDARY ELECTRONSTRANSMISSIONSCATTERINGSOLIDSMEDLINE:37449783