Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent Reactivity

Grillo, FabioFabioGrilloVan Ommen, RuudRuudVan OmmenClerix, Jan-WillemJan-WillemClerixMarques, EstebanEstebanMarquesSoethoudt, JobJobSoethoudtPourtois, GeoffreyGeoffreyPourtoisDelabie, AnneliesAnneliesDelabie2022-06-242021-11-022022-05-162022-06-022022-06-242021-08-112196-7350WOS:000698502900001https://imec-publications.be/handle/20.500.12860/37558Selectivity Enhancement for Ruthenium Atomic Layer Deposition in Sub-50 nm Nanopatterns by Diffusion and Size-Dependent ReactivityJournal article10.1002/admi.202100846WOS:000698502900001Atomic, molecular & chemical physicsCHEMICAL-VAPOR-DEPOSITIONEPITAXIAL-GROWTHNUCLEATIONArea-selective depositionruthenium