XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicides

Conard, ThierryThierryConardDe Gendt, StefanStefanDe GendtBaklanov, MikhaïlMikhaïlBaklanovVos, RitaRitaVosHeyns, MarcMarcHeynsVandervorst, WilfriedWilfriedVandervorst2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2458XPS study of the cleaning efficiency by ozone processes of protective films formed by reactive ion etching of Co and Ti silicidesOral presentation