Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device node

Montgomery, Patrick K.Patrick K.MontgomeryLitt, LloydLloydLittConley, WillWillConleyLucas, KevinKevinLucasvan Wingerden, JohannesJohannesvan WingerdenVandenberghe, GeertGeertVandenbergheWiaux, VincentVincentWiaux2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9322Comparisons of 9% versus 6% transmission attenuated phase shift mask for the 65nm device nodeJournal article