Kaushik, VidyaVidyaKaushikClaes, MartineMartineClaesDelabie, AnneliesAnneliesDelabieVan Elshocht, SvenSvenVan ElshochtRichard, OlivierOlivierRichardRohr, ErikaErikaRohrWitters, ThomasThomasWittersCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10683Observation and characterization of defects in HfO2 high-k gate dielectric layersJournal article