Progressive degradation of TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stress

Rafi, Joan MarcJoan MarcRafiSimoen, EddyEddySimoenMercha, AbdelkarimAbdelkarimMerchaCollaert, NadineNadineCollaertCampabadal, FrancescaFrancescaCampabadalClaeys, CorCorClaeys2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14353Progressive degradation of TiN/SiON and TiN/HfO2 gate stack triple gate SOI nFinFETs subjected to electrical stressOral presentation