Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residues

Kraus, HaraldHaraldKrausSnow, JimJimSnowVan Doorne, PatrickPatrickVan DoorneMertens, PaulPaulMertensKovacs, F.F.Kovacs2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7755Etching of HfO2, deposited on LPCVD Si3N4, and cleaning of Hf residuesOral presentation