Transient clustering of reaction intermediates during wet etching of silicon nanostructures

Aabdin, ZainulZainulAabdinXu, XiuMeiXiuMeiXuSen, SoumyoSoumyoSenAnand, UtkarshUtkarshAnandKral, PetrPetrKralHolsteyns, FrankFrankHolsteynsMirsaidov, UtkurUtkurMirsaidov2021-10-242021-10-2420171530-6984https://imec-publications.be/handle/20.500.12860/27689Transient clustering of reaction intermediates during wet etching of silicon nanostructuresJournal articlehttp://pubs.acs.org/doi/abs/10.1021/acs.nanolett.7b00196