Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughness

Drygianakis, D.D.DrygianakisNijkerk, M.D.M.D.NijkerkPatsis, G.P.G.P.PatsisKokkoris, G.G.KokkorisRaptis, I.I.RaptisLeunissen, PeterPeterLeunissenGogolides, E.E.Gogolides2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12104Simulation of the combined effects of polymer size, acid diffusion length, and EUV secondary electron blur on resist line-edge roughnessProceedings paper