Satta, AlessandraAlessandraSattaVantomme, AndreAndreVantommeSchuhmacher, JorgJorgSchuhmacherWhelan, CarolineCarolineWhelanSutcliffe, VictorVictorSutcliffeMaex, KarenKarenMaex2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9553Initial growth mechanism of atomic layer deposited TiNJournal article