On the role of nanocavities in suppressing boron transient enhanced diffusion and deactivation in F+ coimplanted silicon

Giles, Luis FelipeLuis FelipeGilesStapelmann, ChrisChrisStapelmannCerva, HansHansCervaJahnel, FranzFranzJahnelDemeurisse, CarolineCarolineDemeurisseVrancken, ChristaChristaVranckenHoffmann, Thomas Y.Thomas Y.Hoffmann2021-10-172021-10-1720080021-8979https://imec-publications.be/handle/20.500.12860/13772On the role of nanocavities in suppressing boron transient enhanced diffusion and deactivation in F+ coimplanted siliconJournal article