Vankerckhoven, HansHansVankerckhovenDe Smedt, FrankFrankDe SmedtVandersmissen, KevinKevinVandersmissenClaes, MartineMartineClaesDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsVinckier, ChrisChrisVinckier2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11479Photoresist stripping by Ozone/water processes: effect of additivesProceedings paper