Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching

Vanhove, NicoNicoVanhoveLievens, PeterPeterLievensVandervorst, WilfriedWilfriedVandervorst2021-10-192021-10-1920110142-2421https://imec-publications.be/handle/20.500.12860/20037Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etchingJournal article