Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications

Philipsen, VickyVickyPhilipsenLeunissen, PeterPeterLeunissenDe Ruyter, RudiRudiDe RuyterJonckheere, RikRikJonckheereMartin, PatrickPatrickMartinWakefield, ClareClareWakefieldJohnson, StephenStephenJohnsonCangemi, MikeMikeCangemiBuxbaum, AlexAlexBuxbaumMorrison, TroyTroyMorrison2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/11016Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applicationsProceedings paper