Design split and double exposure for contact hole printing at 0.40 k1 and beyond

Köhler, CarstenCarstenKöhlervan Praagh, JudithJudithvan PraaghFinders, JoJoFindersWiaux, VincentVincentWiauxVandenberghe, GeertGeertVandenberghe2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9140Design split and double exposure for contact hole printing at 0.40 k1 and beyondProceedings paper