Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrology

Das, ShubhankarShubhankarDasBlanco, VictorVictorBlancoDey, BappadityaBappadityaDeyLiu, XiangXiangLiuSchelcher, GuillaumeGuillaumeSchelcherDe Simone, DaniloDaniloDe Simone2025-07-072025-05-112025-07-072024978-1-5106-8155-20277-786XWOS:001467876500010https://imec-publications.be/handle/20.500.12860/45646Single exposure EUV patterning optimization and defect inspection of hexagonal contact hole arrays using voltage contrast metrologyProceedings paper10.1117/12.3034189978-1-5106-8156-9WOS:001467876500010